Title | Ferrofluid masking for lithographic applications |
Publication Type | Journal Article |
Year of Publication | 2004 |
Authors | B Yellen, and G Friedman |
Journal | 2004 Nsti Nanotechnology Conference and Trade Show Nsti Nanotech 2004 |
Volume | 1 |
Start Page | 451 |
Pagination | 451 - 454 |
Date Published | 11/2004 |
Abstract | A novel self-aligned "soft masking" method that is compatible with traditional photolithographic processes is demonstrated. This method uses a suspension of ultra-fine iron oxide grains (ferrofluid) to protect or de-protect selected areas of a magnetically patterned substrate according to a programmable sequence. Automatic mask formation and registration is controlled by ferromagnetic alignment marks patterned on a substrate. External magnetic field bias applied to the system causes ferrofluid to aggregate only over designated areas on the surface, thereby masking those areas from UV or chemical exposure. |
Short Title | 2004 Nsti Nanotechnology Conference and Trade Show Nsti Nanotech 2004 |