Title | Ferrofluid lithography |
Publication Type | Journal Article |
Year of Publication | 2004 |
Authors | BB Yellen, G Fridman, and G Friedman |
Journal | Nanotechnology |
Volume | 15 |
Issue | 10 |
Pagination | S562 - S565 |
Date Published | 10/2004 |
Abstract | A novel self-aligned 'soft masking' method that is compatible with traditional photolithographic processes is demonstrated. This method uses a suspension of ultrafine iron oxide grains (ferrofluid) to protect or de-protect selected areas of a magnetically patterned substrate according to a programmable sequence. Automatic mask formation and registration is controlled by ferromagnetic alignment marks patterned on a substrate. External magnetic field bias applied to the system causes ferrofluid to aggregate only over designated areas on the surface, thereby masking those areas from UV or chemical exposure. |
DOI | 10.1088/0957-4484/15/10/011 |
Short Title | Nanotechnology |